| competency Question | Which kind of material has been tested (metal, ceramic, polymer,…)?
Which reference sample has been used for system calibration (fused quartz, sapphire, etc.)?
Which indenter tip has been used (Vickers, Berkovich, etc.)?
How was the sample mounted on the sample holder?
How was the sample prepared for testing (mechanical polishing, electropolishing,…)?
Which is the surface roughness of the sample?
Which were testing humidity and temperature?
How many measurements were completed?
At which locations? (for mapping)
Which loading history has the sample undergone (quasi-static, continuous stiffness measurement, high-speed,…)?
Which method has been used for data analysis (Oliver-Pharr, etc.)?
Have other properties been investigated, apart from Hardness and Modulus?
Were the tip area function and machine compliance calibrated immediately after testing? If not, when was the last calibration performed?
Have images (micrographs) of the indentation marks been acquired?
Who is the person (user) who did the experiment?
What type is the material? (thin film, multilayered, bulk - single phase, bulk - complex, MEMS, nanopatterned)
What is the method used for the validation of nanoindentation? (correlate individual indents with microstructure: X-ray mapping, AFM, EDS, EBDS)
What is the speed of measurement? (is it high-speed? - i.e. fast protocol? ~ 1h, high-resolution nanoindentation protocol ~ 1 day).
What is the speed per indent? (i.e. 1 indent/second, 1 indent/minute, ...)
What is the instrument type?
What is the (total) thickness of the thin-film (multi-)layer?
How many layers compose the multilayered film? (1, 2, 3, ...)
How many layers is the sample made up of?
What is the thickness of each layer?
Which materials are the layers composed of?
Has the surface been etched to reveal microstructure?
Which etchant has been used?
Which reference sample has been used for system calibration (fused quartz, sapphire, Polymeric Material, etc.)?
Was the sample embedded in a matrix for sample preparation (e.g. resin)?
Type of resin?
What is the thickness of the sample?
Was the sample previously submitted to a conditioning (temperature, humidity, Duration)?
What are the testing parameters: Maximum load, targeted depth, strain rate, drift rate, maximal holding time?
Which kind of material has been tested (Reflective solid samples, bulk and thin films)?
Which reference sample has been used for Monochromator Calibration and optical alignment (Al sample)?
Which reference sample has been used for evaluation of calibration state (bulk c-Si reference sample)?
How was the sample mounted on the ellipsometer stage (Positioning and alignment of the sample adjusting height, tilt etc)?
What was the characterisation environment (Ambient, inert atmosphere)?
Which was the selected measurement method (Spectroscopic Mono/MWL, Kinetic Mono/MWL)?
Which were the input parameters for the measurement (AOI, M-A Angle, Spectral range, Spectrum acquisition step, Light integration duration, Accumulation…)?
How many measurements were completed (Static measurements, real time)?
At which locations? (mapping…)
Which were the data analysis procedures used for the post-processing of the raw data (Spectroscopic or kinetic theoretical optical model)?
Which were the investigated properties? (Thickness, optical properties of materials, information on the optical functions, surface roughness, interface layers…)
Which software used for post-processing (DeltaPsi2, Excel, Origin etc.)?
Was the system calibrated immediately after the measurement(s) end? If not, when was the last calibration performed?
Who is the person (user) who did the experiment?
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